The PLD (pulsed laser deposition) method allows you to apply a high-quality coating with a thickness of only a few microns. Pulsed UV laser is used as a power source. High energy density allows you to apply layers with unique characteristics. It is also possible to integrate other technologies (e.g., sputtering, electron beam deposition), ion sources, chambers with load lock modules, or masking systems (in a vacuum) within the cluster deposition system.
This complex system allows scientists to create deposition systems with structured multilayers.